Evaluation of crystallinity of ultra-thin films by high-temperature XRD.
An effective means to understand phase changes, chemical reactions, and changes in lattice constants due to temperature conditions!
We would like to introduce our "Evaluation of Crystallinity of Ultra-Thin Films using High-Temperature XRD." High-temperature X-ray diffraction (XRD) is an effective method for understanding phase changes, chemical reactions, and changes in lattice constants of various materials under different temperature conditions. In the attached PDF document, we present a case study evaluating the changes in the crystal structure of nm-order ultra-thin films using In-Plane XRD and high-temperature measurements, so please take a look. 【Features of High-Temperature + In-Plane XRD】 ■ A method that involves incident X-rays at very low angles and scans the detector in the in-plane direction ■ The incident X-rays do not penetrate deeply from the surface and can only detect diffraction planes that are perpendicular to the surface ■ Information about crystals can be obtained even for ultra-thin films of a few nm *For more details, please download the PDF or feel free to contact us.
- 企業：東芝ナノアナリシス
- 価格：Other
